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  4. 3D simulation of silicon-based single-electron transistors
 
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2017
Conference Paper
Title

3D simulation of silicon-based single-electron transistors

Other Title
3D-Simulation von siliciumbasierten Einzelelektronentransistoren
Abstract
Single electron transistors based on silicon nanopillars were investigated with regard to their current voltage characteristics. The simulations make use of the commercial quantum simulator nextnano++, but extend its functionality for the calculation of tunneling currents. A comparison with results obtained by the Monte-Carlo based tunneling simulator SIMON is presented. Investigations include the variation of geometrical quantities and quantum dot doping.
Author(s)
Klüpfel, Fabian J.
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Pichler, Peter  orcid-logo
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Mainwork
International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2017  
Project(s)
IONS4SET  
Funder
European Commission EC  
Conference
International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) 2017  
Open Access
File(s)
Download (673.8 KB)
Rights
Use according to copyright law
DOI
10.23919/SISPAD.2017.8085268
10.24406/publica-r-398534
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • Quantum Dot

  • single electron transistor

  • numerical simulation

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