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Resistless Ga+ beam lithography for flexible prototyping of nanostructures
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2019
Presentation
Title
Resistless Ga+ beam lithography for flexible prototyping of nanostructures
Title Supplement
Presentation held at 16th Vacuum Nanoelectronics Symposium, February 28th - March 1st, 2019, Tokyo, Japan
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Author(s)
Rommel, Mathias
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
Conference
Vacuum Nanoelectronics Symposium 2019
DOI
10.24406/publica-fhg-405704
File(s)
N-565736.pdf (10.56 MB)
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Rights
Under Copyright
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
Keyword(s)
focused ion beam
FIB
resistless Ga+ beam lithography
nanopatterning