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  4. Resistless Ga+ beam lithography for flexible prototyping of nanostructures
 
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2019
Presentation
Title

Resistless Ga+ beam lithography for flexible prototyping of nanostructures

Title Supplement
Presentation held at 16th Vacuum Nanoelectronics Symposium, February 28th - March 1st, 2019, Tokyo, Japan
Author(s)
Rommel, Mathias  orcid-logo
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Conference
Vacuum Nanoelectronics Symposium 2019  
File(s)
Download (10.56 MB)
Rights
Use according to copyright law
DOI
10.24406/publica-fhg-405704
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • focused ion beam

  • FIB

  • resistless Ga+ beam lithography

  • nanopatterning

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