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  4. Influence of Al doping concentration and annealing parameters on TiAl based ohmic contacts on 4H-SiC
 
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2017
Poster
Title

Influence of Al doping concentration and annealing parameters on TiAl based ohmic contacts on 4H-SiC

Title Supplement
Poster presented at International Conference on Silicon Carbide and Related Materials, September 17th - 22th, 2017, Washington, D.C., USA
Author(s)
Kocher, Matthias  
Rommel, Mathias  orcid-logo
Erlbacher, Tobias  
Bauer, Anton
Conference
International Conference on Silicon Carbide and Related Materials (ICSCRM) 2017  
File(s)
Download (1.06 MB)
Rights
Use according to copyright law
DOI
10.24406/publica-fhg-397884
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
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