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  4. Empirical cluster modeling revisited
 
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2016
Conference Paper
Title

Empirical cluster modeling revisited

Other Title
Empirische Clustermodellierung neu betrachtet
Abstract
Impurities being present in a semiconductor in high concentrations may form agglomerates. Agglomeration usually demobilizes the impurities and, in case of dopants, also renders them electrically inactive. A standard approach in continuum process simulation assumes the formation of energetically favorable small clusters of size m. High numbers of m are used to mimic an often desired saturation of the concentration of unclustered impurity atoms with increasing total concentration. However, for systems far from equilibrium, potentiated high concentrations may lead to numerical problems. In this work, an alternative formulation is presented which features a saturation of the unclustered impurity concentration while introducing only one equation derived from Waite's theory of diffusion-limited reactions.
Author(s)
Pichler, Peter  orcid-logo
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Mainwork
International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2016  
Conference
International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) 2016  
Open Access
File(s)
Download (575.63 KB)
Rights
Use according to copyright law
DOI
10.1109/SISPAD.2016.7605143
10.24406/publica-r-393557
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • impurity clustering

  • empirical models

  • arsenic

  • silicon

  • solubility

  • process simulation

  • TCAD

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