• English
  • Deutsch
  • Log In
    or
  • Research Outputs
  • Projects
  • Researchers
  • Institutes
  • Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization effects
 
  • Details
  • Full
Options
2005
  • Konferenzbeitrag

Titel

Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization effects

Author(s)
Erdmann, A.
Hauptwerk
EMLC 2005 : 21th European Mask and Lithography Conference. Proceedings
Konferenz
European Mask and Lithography Conference (EMLC) 2005
Thumbnail Image
DOI
10.1117/12.637285
Language
Englisch
google-scholar
IISB
  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Send Feedback
© 2022