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Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization effects
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2005
Conference Paper
Title
Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization effects
Author(s)
Erdmann, A.
Mainwork
EMLC 2005 : 21th European Mask and Lithography Conference. Proceedings
Conference
European Mask and Lithography Conference (EMLC) 2005
DOI
10.1117/12.637285
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
