3D simulation of light exposure and resist effects in laser direct write lithography

We present a simulation approach that includes light and photoresist effects in laser direct write lithography (LDWL). This simulation flow allows to predict how the fabricated structure changes with variation in the process parameters. Using this simulation approach, we compute the change in feature size or critical dimension (CD) versus laser power and writing speed. The obtained simulation result agrees with experimental results. We extend this simulation method to predict the axial resolution of woodpile like structures and mesa arrays, which provide interesting patterns for metamaterials.