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  4. Operation of spatial light modulators in DUV light
 
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2003
Conference Paper
Title

Operation of spatial light modulators in DUV light

Abstract
The Fraunhofer Institute for Microelectronic Circuits and Systems (FhG-IMS) has developed spatial light modulators (SLM), which are used in a pattern generator for DUV laser mask writing developed by Micronic Laser Systems. They consist of micromirror arrays and allow massive parallel writing in UV mask writers. The chip discussed here consists of 2048 × 512 individually addressable mirrors and can be run at a frame rate of 1 to 2 kHz. For this application it is necessary that the SLMs can be operated under DUV light without changing their performance. This paper discusses a failure mechanism of the SLMs when operated in DUV light and countermeasures to eliminate this effect.
Author(s)
Dauderstädt, U.
Dürr, P.
Krellmann, M.
Karlin, T.
Berzinsh, U.
Leonardsson, L.
Wendrock, H.
Mainwork
MOEMS and miniaturized systems III  
Conference
Conference on MOEMS and Miniaturized Systems 2003  
DOI
10.1117/12.477805
Language
English
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Keyword(s)
  • optical MEMS

  • spatial light modulator

  • DUV

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