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Rigorous mask modeling beyond the Hopkins approach
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2006
Conference Paper
Title
Rigorous mask modeling beyond the Hopkins approach
Author(s)
Schermer, J.
Evanschitzky, P.
Erdmann, A.
Mainwork
EMLC 2006, 22nd European Mask and Lithography Conference
Conference
European Mask and Lithography Conference (EMLC) 2006
DOI
10.1117/12.692730
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
