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Plasma source for ion and electron beam lithography
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1998
Journal Article
Title
Plasma source for ion and electron beam lithography
Author(s)
Lee, Y.
Leung, K.N.
Fallmann, W.
Torkler, M.
Bruenger, W.H.
Journal
Journal of vacuum science and technology B. Microelectronics and nanometer structures
DOI
10.1116/1.590460
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT