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  4. Compensation of field-dependent lateral chromatic aberrations in multiwavelength digital holography
 
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2026
Conference Paper
Title

Compensation of field-dependent lateral chromatic aberrations in multiwavelength digital holography

Abstract
Multiwavelength digital holography (MWDH) enables surface measurements with sub-micrometer precision, even for optically rough surfaces. The use of synthetic wavelengths reduces speckle effects and unambiguity issues. This work addresses challenges in MWDH related to field-position dependent lateral chromatic aberrations, especially when using small synthetic wavelengths. These are achieved by combining spectrally distant phase-maps, e.g. corresponding to the red and green spectrum of light. We present a novel fiber-based calibration procedure and a compensation technique for field-position dependent chromatic aberrations, ensuring near-diffraction-limited measurements across the entire field of view (FOV). Experimental validation demonstrates significantly improved lateral resolution and supports more cost-effective sensor designs, even for industrial applications.
Author(s)
Aslan, Marc Johannes  orcid-logo
Fraunhofer-Institut für Physikalische Messtechnik IPM  
Fratz, Markus  
Fraunhofer-Institut für Physikalische Messtechnik IPM  
Seyler, Tobias  
Fraunhofer-Institut für Physikalische Messtechnik IPM  
Bertz, Alexander  
Fraunhofer-Institut für Physikalische Messtechnik IPM  
Carl, Daniel  
Fraunhofer-Institut für Physikalische Messtechnik IPM  
Breunig, Ingo  
Universität Freiburg, IMTEK
Mainwork
Optics and Photonics for Advanced Dimensional Metrology IV  
Conference
Conference "Optics and Photonics for Advanced Dimensional Metrology" 2026  
DOI
10.1117/12.3099325
Language
English
Fraunhofer-Institut für Physikalische Messtechnik IPM  
Keyword(s)
  • Digital holography

  • Multiwavelength

  • Aberrations

  • Compensation

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