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2025
Book Article
Title
Silicon carbide growth and properties for quantum technologies
Abstract
The material properties of silicon carbide play a pivotal role in the quality of color centers and, thus, the performance of quantum devices. This chapter describes the fundamental structural properties of silicon carbide that are pertinent to quantum applications. It outlines the fabrication processes of silicon carbide wafers and elucidates how they impact the material properties. In contrast to SiC electronics, quantum devices necessitate either free-standing structures or hetero-substrates to facilitate light confinement. This chapter presents various methods for fabricating hetero-substrates, or SiC-on-insulator substrates. It also provides an overview of point defect engineering techniques for preparing the material for the subsequent generation of color centers. Additionally, it describes the isotopic requirements of quantum applications and the production of isotope-controlled materials.
Author(s)
Scharin-Mehlmann, Marina
Parthasarathy, Shravan Kumar
Journal
Nanophotonics with Diamond and Silicon Carbide for Quantum Technologies
Keyword(s)
3C-SiC
4H-SiC
annealing
chemical vapor deposition
crystal growth
crystal properties
CVD
doping
epitaxy
grinding
heterosubstrate
ion implantation
isotope
Materials processing
nuclear spin
oxidation
physical vapor transport
point defects
polishing
polytype
precursor
PVT
SiC-on-insulator
structural defects
substrate bonding
surface passivation