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2025
Conference Paper
Title
Ion Beam Sputtering for Substrate Deposition with a Size of 2m: Simulation and Optimization
Abstract
The deposition process by ion beam sputtering is scaled to a huge substrate size. Homogeneous coatings are optimized by adjusting the moveable target positions. A digital twin model combines gas flow and atomistic growth simulations.
Author(s)
Mainwork
Optical Interference Coatings Oic 2025 in Proceedings Optica Oic Optical Interference Coatings Conference 2025
Conference
Optical Interference Coatings Conference 2025, OIC 2025