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  4. Double-sided measurement of defect density on through-structured wafers before wafer level bonding
 
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2023
Conference Paper
Title

Double-sided measurement of defect density on through-structured wafers before wafer level bonding

Abstract
In this paper we present a method for double-sided measurement of defect density on through-structured 200 mm silicon wafers. The detection of the defects is carried out using a standard microscope in the dark-field mode, using a wafer-edge handling system. An automatic pattern recognition locates and quantifies the defects based on the acquired images.
Author(s)
Langa, Sergiu  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Bornhorst, Kirstin  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Urban, Marco
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Scharnweber, Michael
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Doleschal, Wolfgang
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Rieck, Andreas  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Tille, Christian
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Weise, Juliane
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Kaiser, Bert
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Mainwork
Mikrosystemtechnik Kongress 2023 Mikroelektronik Mikrosystemtechnik Und Ihre Anwendungen Nachhaltigkeit Und Technologiesouveranitat Proceedings
Conference
MikroSystemTechnik Kongress 2023: Mikroelektronik, Mikrosystemtechnik und ihre Anwendungen - Nachhaltigkeit und Technologiesouveranitat MicroSystems Technology Congress 2023: Microelectronics, Microsystems Technology and their Applications - Sustainability and Technology Sovereignty
Language
English
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
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