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  4. Thermal Characterization of GaN Power HEMTs by Transient I-V Curves, Infrared Microscopy, and Thermal Simulation
 
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2025
Journal Article
Title

Thermal Characterization of GaN Power HEMTs by Transient I-V Curves, Infrared Microscopy, and Thermal Simulation

Abstract
This work investigates the thermal charac teristics of gallium nitride (GaN) high-electron mobility transistors (HEMTs) for power applications. Exemplarily, a
650-V class HEMT is analyzed by different thermal charac terization methods such as transient I–V measurements, infrared (IR) microscopy, and simulations, presenting a comprehensive insight into the thermal behavior. A new electrothermal model function is derived for the extraction of thermal parameters by transient I–V measurements, and it is not limited to the linear region of the output charac teristic, as a model presented in previous work, but also applicable in the saturation region. Fifth-order Foster model parameters are extracted for different operating points in linear and saturation regions. For verification and better understanding, the measurements are also performed by IR microscopy at same operating points enabling the charac terization of the device’s surface temperature distribution. Two new analytical models allow the interpretation of the temperature distribution and are used as fit formulas for extracting the thermal parameters found by IR microscopy. Finally, the research includes an investigation using tech nology computer-aided design (TCAD) simulation, followed by a thermal 3-D finite element simulation. The results allow a deeper understanding of the electrothermal behavior of GaN power HEMTs at various operating points.
Author(s)
Reiner, Richard  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Basler, Michael  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Mönch, Stefan  orcid-logo
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Grieshaber, Daniel
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Dammann, Michael  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Döring, Philipp
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Waltereit, Patrick  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Quay, Rüdiger  orcid-logo
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Journal
IEEE transactions on electron devices  
Open Access
File(s)
Download (1.49 MB)
Rights
CC BY 4.0: Creative Commons Attribution
DOI
10.1109/TED.2025.3618217
10.24406/publica-7331
Additional link
Full text
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • channel temperature

  • electrothermal model

  • high-electron mobility transistor (HEMT)

  • junction temperature

  • linear region

  • pulsed measurement

  • self-heating

  • thermal impedence

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