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  4. Direct investigation of localized leakage currents in GaN-on-sapphire pn-diodes
 
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2025
Journal Article
Title

Direct investigation of localized leakage currents in GaN-on-sapphire pn-diodes

Abstract
The reliability and robustness of GaN devices continues to suffer from the influence of high dislocation densities. Our group has previously linked dislocations with current leakage paths. In this study, we investigated the localized electroluminescence (EL) signals of these leakage paths in reverse biased GaN pn-diodes grown on a sapphire substrate for their electrical and structural properties. We show that EL signal correlated leakage currents can be modeled by trap-assisted-tunneling (TAT) through segregated impurities at a dislocation. Leakage currents in devices without these leakage paths can be modeled by the Poole-Frenkel (PF) and phonon-assisted-tunneling (PAT) mechanisms. Additionally, we show that this reverse bias leakage, that has historically been attributed to specific dislocation types, cannot be attributed to a specific Burgers vector type.
Author(s)
Kinstler, Alexander D.
Friedrich-Alexander-Universität Erlangen-Nürnberg
Neumann, Richard
Infineon Technologies AG
Taylor, Aidan Arthur
Infineon Technologies Austria AG
Besendörfer, Sven
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Meißner, Elke  
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Weingärtner, Roland
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Brunner, Frank
Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik
Brusaterra, Enrico
Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik
Bahat-Treidel, Eldad
Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik
Schulze, Jörg
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Journal
Scientific Reports  
Open Access
File(s)
Download (4.17 MB)
Rights
CC BY-NC-ND 4.0: Creative Commons Attribution-NonCommercial-NoDerivatives
DOI
10.1038/s41598-025-25338-0
10.24406/publica-6757
Additional link
Full text
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • Dislocation

  • GaN

  • Localized leakage

  • Pn-diode

  • Trap-assisted-tunneling

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