High-resolution and high-speed EUV ptychography: quantitative imaging with enhanced material contrast

Microscopy using extreme ultraviolet (EUV) light enables various applications ranging from metrology for the semiconductor industry to the investigation of silicon-based nanomaterials and biological samples. This spectral range offers a unique combination of high resolution, elemental specificity, and penetration depth. The resonances of almost all the chemical elements in the EUV result in notable variations in the complex refractive index. Combined with advanced lensless imaging techniques like ptychography [1], it enables material-specific nanoscale imaging.