• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Effects of the compliance current on the switching of HfO2 and Al:HfO2 memristive devices: characterization and modeling
 
  • Details
  • Full
Options
January 27, 2025
Conference Paper
Title

Effects of the compliance current on the switching of HfO2 and Al:HfO2 memristive devices: characterization and modeling

Abstract
Memristive devices based on HfO2 and Al:HfO2 dielectrics have been fabricated and characterized to investigate their resistive switching (RS) behavior. The study focuses on employing different values of gate voltage (VG) to tune the compliance current (Icc) across multiple one-transistor-one-resistor (1T1R) devices. Advanced parameter extraction techniques were applied to determine key RS parameters, specifically the set voltage (Vset) and reset voltage (Vreset). Additionally, the cumulative distribution function (CDF) for both Vset and Vreset was calculated for all devices to analyze and compare the cycle-to-cycle (C2C) variability of the two technologies. Finally, the Stanford model was utilized to reproduce the experimental measurements, offering insights into the differences in the shapes of the I-V curves for the HfO2 and Al:HfO2-based devices.
Author(s)
Maldonado, D.
Dorai Swamy Reddy, K.
Pechmann, S.
Hagelauer, Amelie  
Fraunhofer-Einrichtung für Mikrosysteme und Festkörper-Technologien EMFT  
Wenger, C.
Roldán, J.B.
Pérez, E.
Mainwork
15th Spanish Conference on Electron Devices, CDE 2025  
Conference
Spanish Conference on Electron Devices 2025  
DOI
10.1109/CDE66381.2025.11038898
Language
English
Fraunhofer-Institut für Elektronische Mikrosysteme und Festkörper-Technologien EMFT  
Keyword(s)
  • Performance evaluation

  • Statistical analysis

  • Shape

  • Shape measurement

  • Semiconductor device reliability

  • Switches

  • Tin

  • Semiconductor process modeling

  • Dielectrics

  • Analytical models

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024