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  4. Comparative study of ZrAlxOy - based MIM decoupling capacitors with high-κ dielectric grown by 3 generations of metalorganic ALD Zr-precursors
 
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August 6, 2024
Poster
Title

Comparative study of ZrAlxOy - based MIM decoupling capacitors with high-κ dielectric grown by 3 generations of metalorganic ALD Zr-precursors

Title Supplement
Poster presented at 24th International Conference on Atomic Layer Deposition, 4-7 August 2024, Helsinki
Author(s)
Falidas, Konstantinos Efstathios  orcid-logo
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Kühnel, Kati  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Viegas, Alison Erlene
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Czernohorsky, Malte  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Conference
International Conference on Atomic Layer Deposition 2024  
File(s)
Download (970.33 KB)
Rights
Use according to copyright law
DOI
10.24406/publica-4883
Language
English
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Fraunhofer Group
Fraunhofer-Verbund Mikroelektronik  
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