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  4. Exceptionally Low Optical Absorption in Aluminum Nitride Thin Films Deposited by Magnetron Sputtering
 
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2024
Conference Paper
Title

Exceptionally Low Optical Absorption in Aluminum Nitride Thin Films Deposited by Magnetron Sputtering

Abstract
AlN addresses issues with traditional thin-film waveguides with its wide-bandgap and broad transparency window. This work demonstrates sputter-deposited AlN thin flms with ultra-low optical absorption, optimized via substrate and sputtering conditions. High-temperature deposition reduced oxygen content, improving transparency. Optical-loss measurements on waveguides confirmed record-low losses.
Author(s)
Raghuwanshi, Mohit
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Sundarapandian, Balasubramanian  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Singh, R.
AMO GmbH
Rijil, T.
AMO GmbH
Suckow, S.
RWTH Aachen  
Lemme, M.C.
AMO GmbH
Mainwork
IEEE Photonics Conference, IPC 2024. Proceedings  
Conference
Photonics Conference 2024  
DOI
10.1109/IPC60965.2024.10799525
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • AIN

  • waveguides

  • sputtering

  • CMOS

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