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  4. Reactive bonding of an integrated CMOS strain sensor to steel by using hard and soft solders
 
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January 1, 2023
Conference Paper
Title

Reactive bonding of an integrated CMOS strain sensor to steel by using hard and soft solders

Abstract
In this project, the suitability of reactive joining using a novel high-energy material system based on the elements zirconium, silicon and aluminum (Zr/Si/Al) for the mounting of a strain sensor on a steel carrier was investigated. For this purpose, CMOS-integrated silicon-based sensor chips were first connected to a flexible printed circuit board and electrically contacted. Subsequently, the chips were metallized on the backside and soldered onto standardized stainless steel tensile specimens using three different methods, and the joint connections were characterized. In the first method, a soft solder paste based on 96.5% tin, 3.0% silver and 0.5% copper was used to solder the chips to the steel tensile specimens using a standard reflow soldering process. As a second process, a Ni/Al-based reactive foil with tin as soft solder on both sides was used for reactive joining of the chips. Third, hard solders consisting of an aluminum-silicon alloy (AlSi12) and a Zr/Si/Al-based reactive multilayer system were deposited directly onto the chip backsides and onto the tensile specimens. Subsequently, the chips were reactively bonded to the tensile specimens. Tensile forces up to 1200 N were applied to the tensile specimens in the longitudinal direction on a tensile testing device for all three joining methods. For each of the 24 individual PMOS sensors, which are sensitive to the normal stresses σxx-σyy, the signals were recorded. The signal differences compared with the unloaded state provide direct information about the respective mechanical coupling. The lowest coupling was achieved with the soft solder paste, and the highest with the combination of Zr/Si/Al and hard solder.
Author(s)
Schumacher, Axel
Hahn-Schickard-Gesellschaft für angewandte Forschung e.V.
Meyer, Peter
Hahn-Schickard-Gesellschaft für angewandte Forschung e.V.
Buschbeck, Georg  
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
Pflug, Erik  
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
Böttcher, Julius  
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
Knappmann, Stephan
Hahn-Schickard-Gesellschaft für angewandte Forschung e.V.
Hehn, Thorsten
Hahn-Schickard-Gesellschaft für angewandte Forschung e.V.
Dehé, Alfons
Hahn-Schickard-Gesellschaft für angewandte Forschung e.V.
Mainwork
MikroSystemTechnik Kongress 2023  
Conference
MikroSystemTechnik Kongress 2023  
Language
English
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
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