Homogeneity of Nanoparticle Layers as Deposited by Gas Phase Condensation (Gpc) and Pe-Cvd Processes

We report on the bottom-up, in vacuum synthesis of nanoparticle layers on static substrates with areas of up to 150 x 200 mm by vapor-phase condensation combined with an additional PE-CVD source for the deposition of organic (plasma polymer) or inorganic dielectric matrix materials. Nanoparticles embedded in a thin film matrix have a wide range of potential applications, from antiviral and antibacterial surfaces, over water treatment, (photo-)catalysis, sensing, and structured surfaces for condensation and heat transfer. Ag, Ti, and Pt nanoparticles are obtained from inert gas phase condensation (GPC) of sputtered atomic vapor, stemming from an inert Gas Flow Sputtering (GFS) source. This method is suitable for the production of virtually all existing metals. Here, we present the stability and the homogeneity of the resulting nanoparticle layers (Ag and Pt NPs). To further inspect the homogeneity of the deposition process, Ag NP / SiOx multilayer nanocomposite layers (embedded nanoparticles in a dielectric matrix) are examined by X-ray diffraction. The synthesis/structure/morphology relations are presented for both the initial random deposition (Ag) as well as the highly porous structure (Ti) obtained during later stages of deposition. Nanoparticle size and structures are reported.