Manufacturing of nanostructures in silicon carbide using UV-nanoimprint lithography in combination with fluorine-based plasma etching

The combination of a multi-layer resist system for soft UV-NIL with a fluorine-based plasma etching is investigated to elaborate homogeneously distributed nanosized features in silicon carbide. Initial studies substantiate that this approach can be a timesaving and cost-effective alternative to generate nanostructures in SiC.