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  4. Material-specific ptychographic imaging at 13.5 nm using a high-order harmonic source
 
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2022
Conference Paper
Title

Material-specific ptychographic imaging at 13.5 nm using a high-order harmonic source

Abstract
We present a high-harmonic driven ptychographic EUV microscope operating at a wavelength of 13.5 nm. Sub-20 nm resolution is demonstrated and the accurate amplitude and phase images are harnessed to identify multiple materials of an integrated circuit.
Author(s)
Eschen, Wilhelm
Loetgering, Lars
Schuster, Vittoria
Klas, Robert
Kirsche, Alexander
Berthold, Lutz  
Fraunhofer-Institut für Mikrostruktur von Werkstoffen und Systemen IMWS  
Steinert, Michael
Pertsch, Thomas  
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Gross, Herbert
Krause, Michael  
Fraunhofer-Institut für Mikrostruktur von Werkstoffen und Systemen IMWS  
Limpert, Jens  
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Rothhardt, Jan  
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Mainwork
Compact EUV & X-ray Light Sources 2022  
Conference
Meeting "Compact EUV & X-ray Light Sources" 2022  
Optica High-brightness Sources and Light-driven Interactions Congress 2022  
DOI
10.1364/EUVXRAY.2022.EW6A.5
Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Fraunhofer-Institut für Mikrostruktur von Werkstoffen und Systemen IMWS  
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