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2022
Presentation
Title
ALD Al2O3/SiO2 Multilayers for c-Si Surface Passivation. Modification of Interface Properties by Voltage Stress and Plasma Treatments
Title Supplement
Presentation held on 22nd International Conference on Atomic Layer Deposition (ALD) 2022, Ghent, Belgium, 27.06.2022-29.06.2022
Author(s)