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  4. Influence of Deposition Temperature on the Electrical and Electrochemical Properties of Carbon-Based Coatings for Metallic Bipolar Plates, Prepared by Cathodic Arc Evaporation
 
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2022
Journal Article
Title

Influence of Deposition Temperature on the Electrical and Electrochemical Properties of Carbon-Based Coatings for Metallic Bipolar Plates, Prepared by Cathodic Arc Evaporation

Abstract
Cathodic arc evaporation is a well-established physical vapor deposition technique which is characterized by a high degree of ionization and high deposition rate. So far, this technique has been mainly used for the deposition of tribological coatings. In this study, anti-corrosive and electrical conductive carbon-based coatings with a metallic interlayer were prepared on stainless steel substrates as surface modification for metallic bipolar plates. Hereby, the influence of the deposition temperature during the deposition of the carbon top layer was investigated. Raman spectroscopy revealed differences in the microstructure at 200°C compared to 300°C and 100°C. Measurements of the interfacial contact resistance showed that the deposited coatings significantly improve the electrical conductivity. There are only minor differences between the different carbon top layers. The corrosion resistance of the coatings was studied via potentiodynamic polarization at room temperature and 80°C. Experiments showed that the coating with a carbon top layer deposited at 200°C, considerably reduces the current density and thus corrosion of the substrate is suppressed.
Author(s)
Steinhorst, Maximilian  orcid-logo
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
Giorgio, Maurizio  
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
Roch, Teja  
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
Leyens, Christoph  orcid-logo
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
Journal
Advances in materials physics and chemistry : AMPC  
Open Access
DOI
10.4236/ampc.2022.124004
Language
English
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
Keyword(s)
  • Bipolar Plate

  • Interfacial Contact Resistance

  • Carbon Thin Film

  • Physical Vapor Deposition

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