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  4. Influence of Crystal Structure, Encapsulation, and Annealing on Photochromism in Nd Oxyhydride Thin Films
 
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January 24, 2022
Journal Article
Title

Influence of Crystal Structure, Encapsulation, and Annealing on Photochromism in Nd Oxyhydride Thin Films

Abstract
Thin films of rare earth metal oxyhydrides show a photochromic effect, the precise mechanism of which is yet unknown. Here, we made thin films of NdH3-2xOx and show that we can change the band gap, crystal structure, and photochromic contrast by tuning the composition (O2–:H–) via the sputtering deposition pressure. To protect these films from rapid oxidation, we add a thin ALD coating of Al2O3, which increases the lifetime of the films from 1 day to several months. Encapsulation of the films also influences photochromic bleaching, changing the time dependency from first-order kinetics. As well, the partial annealing which occurs during the ALD process results in a dramatically slower bleaching speed, revealing the importance of defects for the reversibility (bleaching speed) of photochromism.
Author(s)
Chaykina, Diana  
University of Technology of Delft  
Nafezarefi, Fahimeh  
University of Technology of Delft  
Colombi, Georgio
University of Technology of Delft  
Cornelius, Steffen  
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Bannenberg, Lars  
University of Technology of Delft  
Schreuders, Herman  
University of Technology of Delft  
Dam, Bernhard
University of Technology of Delft  
Journal
Journal of physical chemistry. C, Nanomaterials and interfaces  
Open Access
DOI
10.1021/acs.jpcc.1c10521
Language
English
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Keyword(s)
  • thin film

  • encapsulation

  • ALD

  • sputtering

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