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  4. Charged Device Model (CDM) and Capacitive Coupled Transmission Line Pulsing (CC-TLP) Stress Severity Study on RF ICs
 
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2020
Conference Paper
Title

Charged Device Model (CDM) and Capacitive Coupled Transmission Line Pulsing (CC-TLP) Stress Severity Study on RF ICs

Abstract
This paper studies the CDM stress severity on radiofrequency integrated circuits (RF ICs). The ICs are housed in various IC package sizes and tested with both CDM and CC-TLP test methods. Empirical correlation factors are established based on peak current and energy content driven failure mechanisms of RF pins.
Author(s)
Abessolo-Bidzo, Dolphin
NXP Semiconductors, Gerstweg 2, 6534 AE Nijmegen, the Netherlands
Weber, Johannes  
Fraunhofer-Einrichtung für Mikrosysteme und Festkörper-Technologien EMFT  
Kiriliouk, Victoria
NXP Semiconductors, Gerstweg 2, 6534 AE Nijmegen, the Netherlands
Wolf, Heinrich  
Fraunhofer-Einrichtung für Mikrosysteme und Festkörper-Technologien EMFT  
Verwoerd, Sheela
NXP Semiconductors, Gerstweg 2, 6534 AE Nijmegen, the Netherlands
Jirutková, Ellen  
Fraunhofer-Einrichtung für Mikrosysteme und Festkörper-Technologien EMFT  
Mainwork
42nd Electrical Overstress/Electrostatic Discharge Symposium, EOS/ESD 2020. Proceedings  
Conference
Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD) 2020  
Language
English
Fraunhofer-Einrichtung für Mikrosysteme und Festkörper-Technologien EMFT  
Keyword(s)
  • ESD

  • CDM

  • CC-TLP

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