• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Pathfinding the perfect EUV mask: The role of the multilayer
 
  • Details
  • Full
Options
2020
Conference Paper
Title

Pathfinding the perfect EUV mask: The role of the multilayer

Abstract
Mitigation of 3D-mask effects is a requirement for pushing high-NA (0.55) EUV lithography to its limits. Both the absorber and the reflective multilayer parts of the EUV mask contribute to the 3D-mask effects. This paper focuses on the investigation and optimization of the multilayer. The impact of different multilayer parameters on the imaging performance is investigated and used to explain the optimization outcome. Multilayer optimization yields better lithographic performance by including imaging metrics in the merit function instead of reflectivity data only. Different geometrical representations of the multilayer are optimized and their performances are compared. The results show a tradeoff among different lithographic metrics with improvements compared to a reference obtained from reflectivity optimization.
Author(s)
Mesilhy, H.
Evanschitzky, P.  
Bottiglieri, G.
Setten, E. van
Fliervoet, T.
Erdmann, A.  
Mainwork
Extreme Ultraviolet (EUV) Lithography XI  
Conference
Conference "Extreme Ultraviolet (EUV) Lithography" 2020  
DOI
10.1117/12.2551870
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024