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  4. Large Area TOPCon Cells Realized by a PECVD Tube Process
 
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2019
Conference Paper
Title

Large Area TOPCon Cells Realized by a PECVD Tube Process

Abstract
TOPCon is an appealing choice for next-generation solar cells as it minimizes surface recombination, enables low contact resistivities, and provides high thermal stability thereby rendering it compatible with screen-printed metallization. While TOPCon is commonly realized by low-pressure chemical vapor deposition (LPCVD), this paper discusses the use of a plasma-enhanced chemical vapor deposition (PECVD) tool, which are commonly used for deposition of SiNx or AlOx. It will be shown that thick screen-printing compatible TOPCon layers providing excellent surface passivation can be realized with such tool. Additionally, the firing stability of TOPCon/SiNx stack will be discussed and first solar cell results will be presented. The IV parameters of the best solar cell were: Voc = 691.2 mV, FF = 80.7%, Jsc = 40.4 mA/cm², and = 22.5%.
Author(s)
Feldmann, Frank
Fellmeth, Tobias  
Steinhauser, Bernd  
Nagel, Henning  
Ourinson, Daniel
Richter, Armin  
Mack, Sebastian  
Lohmüller, Elmar  orcid-logo
Polzin, Jana-Isabelle  
Benick, Jan  
Moldovan, Anamaria  
Bivour, Martin  
Clement, Florian  
Rentsch, Jochen  
Hermle, Martin  
Glunz, Stefan W.  
Mainwork
36th European Photovoltaic Solar Energy Conference and Exhibition, EU PVSEC 2019  
Conference
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) 2019  
DOI
10.24406/publica-r-405688
10.4229/EUPVSEC20192019-2EO.1.4
File(s)
N-565499.pdf (714.47 KB)
Language
English
Fraunhofer-Institut für Solare Energiesysteme ISE  
Keyword(s)
  • Photovoltaik

  • Silicium-Photovoltaik

  • Herstellung und Analyse von hocheffizienten Si-Solarzellen

  • passivation

  • PECVD

  • silicon

  • cell

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