2018
Poster
Title

Dose dependent profile deviation of implanted aluminum in 4H-SiC during high temperature annealing

Title Supplement
Poster presented at 22nd International Conference on Ion Implantation Technology, September 16th - 21st, 2018, Würzburg
Author(s)
Kocher, Matthias  
Rommel, Mathias  orcid-logo
Sledziewski, Tomasz
Häublein, Volker  
Bauer, Anton
Conference
DOI
File(s)
Rights
Under Copyright
Language
English