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Challenges for predictive EUV mask modeling
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2016
Presentation
Title
Challenges for predictive EUV mask modeling
Title Supplement
Presentation held at International Workshop on EUV Lithography 2016, June 13-16, 2016, Berkeley, CA
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Author(s)
Evanschitzky, Peter
FhG IISB
Erdmann, Andreas
FhG IISB
Project(s)
SeNaTe
Funder
European Commission EC
Conference
International Workshop on EUV Lithography 2016
DOI
10.24406/publica-fhg-396001
File(s)
N-439144.pdf (1.79 MB)
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Rights
Under Copyright
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB