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  4. Challenges for predictive EUV mask modeling
 
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2016
Presentation
Title

Challenges for predictive EUV mask modeling

Title Supplement
Presentation held at International Workshop on EUV Lithography 2016, June 13-16, 2016, Berkeley, CA
Author(s)
Evanschitzky, Peter  
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Erdmann, Andreas  
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Project(s)
SeNaTe  
Funder
European Commission EC  
Conference
International Workshop on EUV Lithography 2016  
File(s)
Download (1.79 MB)
Rights
Use according to copyright law
DOI
10.24406/publica-fhg-396001
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
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