• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. 4.5 kV SiC junction barrier schottky diodes with low leakage current and high forward current density
 
  • Details
  • Full
Options
2017
Conference Paper
Title

4.5 kV SiC junction barrier schottky diodes with low leakage current and high forward current density

Abstract
High-voltage 4H-SiC Junction Barrier Schottky diodes with a reverse breakdown voltage of over 4.5 kV and a turn-on voltage below 1 V have been fabricated. They achieved a forward current of 5 A at a forward voltage drop of 1.8 V and 20 A at 4.2 V. A low reverse leakage current of 0.3 mA at 1.2 kV and 37 mA at 3.3 kV was measured. The chip size was 7.3 mm x 7.3 mm, the active area 0.25 cm2 and the diode was able to handle a repetitive pulse current density of over 300 A/cm2 without degradation. Floating field rings in combination with a field-stop ring were used as edge termination to reach 73% of the theoretical breakdown voltage. The epitaxial layer was 32 mm thick, with a nitrogen doping concentration of 1x1015 cm-3. The JBS diodes have been manufactured in a 100 mm SiC prototyping line, using well established processing technology, to achieve cost-efficient devices.
Author(s)
Schöck, Johannes
Büttner, Jonas
Rommel, Mathias  orcid-logo
Erlbacher, Tobias  
Bauer, Anton
Mainwork
Silicon carbide and related materials 2016  
Conference
European Conference on Silicon Carbide and Related Materials (ECSCRM) 2016  
Open Access
DOI
10.4028/www.scientific.net/MSF.897.427
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • Junction Barrier Schottky (JBS) Diode

  • DBC-Mounted

  • Floating Field Rings

  • 4H-SiC

  • Leistungselektronik

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024