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La-doped ZrO2 based Back End of Line (BEoL) decoupling capacitors
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2016
Poster
Title
La-doped ZrO2 based Back End of Line (BEoL) decoupling capacitors
Title Supplement
Poster presented at 16th International Conference on Atomic Layer Deposition 2016, July 24th - 27th, 2016, Dublin, Ireland
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Author(s)
Weinreich, Wenke
Fraunhofer-Institut für Photonische Mikrosysteme IPMS
Seidel, Konrad
Fraunhofer-Institut für Photonische Mikrosysteme IPMS
Polakowski, Patrick
Fraunhofer-Institut für Photonische Mikrosysteme IPMS
Drescher, Maximilian
Fraunhofer-Institut für Photonische Mikrosysteme IPMS
Gummenscheimer, A.
Globalfoundries <Dresden, Germany>
Nolan, M.G.
Globalfoundries <Dresden, Germany>
Cheng, L.
Globalfoundries <Malta, NY, USA>
Triyoso, D.H.
Globalfoundries <Malta, NY, USA>
Conference
International Conference on Atomic Layer Deposition 2016
Request publication:
bibliothek@ipms.fraunhofer.de
Language
English
Fraunhofer-Institut für Photonische Mikrosysteme IPMS