• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Calibration of z-axis linearity for arbitrary optical topography measuring instruments
 
  • Details
  • Full
Options
2015
Conference Paper
Title

Calibration of z-axis linearity for arbitrary optical topography measuring instruments

Abstract
The calibration of the height axis of optical topography measurement instruments is essential for reliable topography measurements. A state of the art technology for the calibration of the linearity and amplification of the z-axis is the use of step height artefacts. However, a proper calibration requires numerous step heights at different positions within the measurement range. The procedure is extensive and uses artificial surface structures that are not related to real measurement tasks. Concerning these limitations, approaches should to be developed that work for arbitrary topography measurement devices and require little effort. Hence, we propose calibration artefacts which are based on the 3D-Abbott-Curve and image desired surface characteristics. Further, real geometric structure s are used as an initial point of the calibration artefact. Based on these considerations, an algorithm is introduced which transforms an arbitrary measured surface into a measurement artefact for the z-axis linearity. The method works both for profiles and topographies. For considering effects of manufacturing, measuring, and evaluation an iterative approach is chosen. The mathematical impact of these processes can be calculated with morphological signal processing. The artefact is manufactured with 3D laser lithography and characterized with different optical measurement devices. An introduced calibration routine can calibrate the entire z-axis-range within one measurement and minimizes the required effort. With the results it is possible to locate potential linearity deviations an d to adjust the z-axis. Results of different optical measurement principles are compared in order to evaluate the capabilities of the new artefact.
Author(s)
Eifler, Matthias
Seewig, Jörg
Hering, Julian
Freymann, Georg von  
Fraunhofer-Institut für Photonische Mikrosysteme IPMS  
Mainwork
Optical Measurement Systems for Industrial Inspection IX  
Conference
Conference "Optical Measurement Systems for Industrial Inspection" 2015  
DOI
10.1117/12.2190737
Language
English
Fraunhofer-Institut für Physikalische Messtechnik IPM  
  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024