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  4. Nano- and micrometer scale surface topography modification of Si (100) by Ga focused ion beam irradiation
 
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2015
Poster
Title

Nano- and micrometer scale surface topography modification of Si (100) by Ga focused ion beam irradiation

Title Supplement
Poster presented at BRAMAT 2015, 9th International Conference on Materials Science & Engineering, Brasov, Romania, 5-7 March 2015
Author(s)
Rai, Deepa
Lehrstuhl für Elektronische Bauelemente, Universität Erlangen-Nürnberg
Stumpf, Florian
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Frey, Lothar
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Rommel, Mathias  orcid-logo
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Project(s)
STEEP
Funder
European Commission EC  
Conference
International Conference on Materials Science & Engineering (BRAMAT) 2015  
DOI
10.24406/publica-fhg-388210
File(s)
N-333116.pdf (1.21 MB)
Rights
Under Copyright
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • focused ion beam (FIB)

  • ripple formation

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