PECVD Al2O3 for Surface Passivation: A Review of Solar Cell and Thin Layer Characteristics Silicon Solar Cell

Kühnhold-Pospischil, Saskia; Saint-Cast, Pierre; Hofmann, Marc; Paramanathan, R.; El-Safoury, M.; Kafle, Bishal; Kania, Daniel; Weiss, L.; Heo, Y.-H.; Billot, Etienne; Olwal, P.; Rentsch, Jochen; Preu, Ralf

doi:10.5071/1stAfricaPVSEC2014-1BO.2.1

2014

Conference Paper

Abstract

A review about Al2O3 surface passivation for Si solar cell applications is presented. Whereat, a focus to the industrially relevant deposition technique PECVD is given. Al2O3 was already adapted to several cell concepts including PERC, PERT, TOPCon, EWT and IBC. Latest record cell efficiencies using Al2O3 passivation are summarized in this publication. Further, the passivation mechanism and the structure of Al2O3 are discussed in detail.