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  4. High-power-plasma PECVD of SiNx and Al2O3 for industrial solar cell manufacturing
 
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2013
Conference Paper
Title

High-power-plasma PECVD of SiNx and Al2O3 for industrial solar cell manufacturing

Abstract
Excellent surface passivation is a key feature of high-efficiency c-Si solar cell concepts. Manz AG in collaboration with Fraunhofer ISE has developed a high-power-plasma (HPP) vertical plasma-enhanced chemical vapour deposition (PECVD) system that allows the preparation of excellently passivating hydrogenated amorphous silicon nitride (SiNx) and aluminium oxide (Al2O3) films at high deposition rates, leading to a throughput of about 1200 wafers per hour for one deposited film at a small footprint of the tool. Double layer SiNx front surface anti-reflection coatings (ARC) were outperforming the reference processes at Fraunhofer ISE. Al2O3 layers reached the same level of passivation compared to the reference PECVD process. Control of carbon and oxygen atoms and the oxidizing gas during the deposition helps to maintain a stable and robust process.
Author(s)
Hofmann, Marc  
Kohn, Norbert
Schwarz, F.
Nölker, S.
Kastl, S.
Beckmann, R.
Ferré, R.
Pernau, T.
Trogus, Daniel  
Kühnhold-Pospischil, Saskia  
Saint-Cast, Pierre  
Rentsch, Jochen  
Mainwork
28th European Photovoltaic Solar Energy Conference and Exhibition, EU PVSEC 2013. Proceedings. DVD-ROM  
Conference
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) 2013  
DOI
10.24406/publica-r-381433
10.4229/28thEUPVSEC2013-2BV.1.45
File(s)
001.pdf (201.47 KB)
Language
English
Fraunhofer-Institut für Solare Energiesysteme ISE  
Keyword(s)
  • PV Produktionstechnologie und Qualitätssicherung

  • Silicium-Photovoltaik

  • Oberflächen - Konditionierung

  • Passivierung

  • Lichteinfang

  • Pilotherstellung von industrienahen Solarzellen

  • Coating

  • Based Deposition

  • Deposition Rate

  • Interfaces

  • Passivation

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