2013
Presentation
Title

Accuracy of wafer level alignment with substrate conformal imprint lithography

Title Supplement
Presentation held at 12th International Conference on Nanoimprint and Nanoprint Technology (NNT), October 21 - 23, 2013, Barcelona, Spain
Author(s)
Fader, Robert
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Rumler, M.
Rommel, Mathias  orcid-logo
Bauer, A.J.
Frey, L.
Verschuuren, M.A.
Laar, R. van de
Ji, R.
Schömbs, U.
Conference
File(s)
Rights
Use according to copyright law
DOI
Language
English