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  4. Modeling strategies for EUV mask multilayer defect dispositioning and repair
 
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2013
Conference Paper
Title

Modeling strategies for EUV mask multilayer defect dispositioning and repair

Abstract
The paper describes a modeling approach, which enables systematic printing and compensation repair studies for multilayer defects on EUV-masks. The procedure combines an approximative model for the pre-optimization of required repair shapes with an accurate and efficient, fully rigorous modeling of the final repair shape. The obtained simulations results demonstrate the capabilities of compensation repair to reduce the impact of defects and confirm the eligibility of this technique as a valuable and important ingredient of a defect mitigation strategy for EUV masks.
Author(s)
Erdmann, A.  
Evanschitzky, P.  
Bret, T.
Jonckheere, R.
Mainwork
Extreme Ultraviolet (EUV) Lithography IV  
Conference
Conference "Extreme Ultraviolet (EUV) Lithography" 2013  
DOI
10.1117/12.2011444
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
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