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  4. Laser chemical metal deposition for silicon solar cell metallization
 
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2012
Conference Paper
Title

Laser chemical metal deposition for silicon solar cell metallization

Abstract
This work describes the development of the Laser Chemical Metal Deposition (LCMD) process for silicon solar cell metallisation. The LCMD process can be considered as an advanced and promising method for solar cell metallisation. With LCMD a metal seed layer is created on the surface of a silicon wafer. Subsequently, the seed layer is thickened by a plating process. It is a low temperature metallisation scheme that does not need any additional masking processes. In this work different nickel solutions and laser configurations were analyzed. Variations of laser power, repetition number and scan speed were performed and the resulting contacts were characterized. With the optimized parameters, silicon solar cells with efficiencies up to 17.9 % have been processed and demonstrate the great potential of LCMD.
Author(s)
Wehkamp, Niklas
Fell, Andreas  
Bartsch, Jonas  
Granek, Filip
Mainwork
Third Workshop on Metallization for Crystalline Silicon Solar Cells 2011. Proceedings  
Conference
Workshop on Metallization for Crystalline Silicon Solar Cells 2011  
Open Access
DOI
10.1016/j.egypro.2012.05.007
Language
English
Fraunhofer-Institut für Solare Energiesysteme ISE  
Keyword(s)
  • Solarzellen - Entwicklung und Charakterisierung

  • Silicium-Photovoltaik

  • Kontaktierung und Strukturierung

  • Industrielle und neuartige Solarzellenstrukturen

  • Produktionsanlagen und Prozessentwicklung

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