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  4. Hall effect characterizations of 4H-SiC MOSFETs: Influence of nitrogen channel implantation
 
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2012
Poster
Title

Hall effect characterizations of 4H-SiC MOSFETs: Influence of nitrogen channel implantation

Title Supplement
Poster at European Conference on Silicon Carbide and Related Materials, ECSCRM 2012, September 2 - 6, 2012, Saint Petersburg
Author(s)
Mortet, V.
Bedel-Pereira, E.
Bobo, J.
Strenger, C.
Uhnevionak, V.
Burenkov, A.  
Cristiano, F.
Bauer, A.
Conference
European Conference on Silicon Carbide and Related Materials (ECSCRM) 2012  
File(s)
Download (628.58 KB)
Rights
Use according to copyright law
DOI
10.24406/publica-fhg-377219
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • 4H-SiC

  • MOSFET

  • hall effect

  • hall mobility

  • charge carrier density

  • Coulomb scattering

  • nitrogen implantation

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