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  4. Influence of epilayer thickness and structural defects on the minority carrier lifetime in 4H-SiC
 
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2012
Poster
Title

Influence of epilayer thickness and structural defects on the minority carrier lifetime in 4H-SiC

Title Supplement
Poster at European Conference on Silicon Carbide and Related Materials, ECSCRM 2012, September 2 - 6, 2012, Saint Petersburg
Abstract
4H-SiC homoepitaxial layers with different thicknesses from 12.5 µm up to 50 µm were investigated by microwave-detected photoconductivity decay (µ-PCD), deep level transient spectroscopy (DLTS) and defect selective etching (DSE) to shed light on the influence of the epilayer thickness and structural defects on the effective minority carrier lifetime. It is shown that the effective lifetime, resulting directly from the µ-PCD measurement, is significantly influenced by the surface recombination lifetime. Therefore, an adequate correction of the measured data is necessary to determine the bulk lifetime. The bulk lifetime of these epilayers is in the order of several microseconds. Furthermore, areas with high dislocation density are correlated to areas with locally reduced effective lifetime.
Author(s)
Kallinger, Birgit  orcid-logo
Berwian, Patrick  orcid-logo
Friedrich, Jochen  
Azizi, Maral
Rommel, Mathias  orcid-logo
Hecht, Christian
Friedrichs, Peter
Conference
European Conference on Silicon Carbide and Related Materials (ECSCRM) 2012  
File(s)
Download (1.24 MB)
Rights
Use according to copyright law
DOI
10.24406/publica-fhg-376592
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • epitaxial layers

  • CVD

  • structural defect

  • minority carrier lifetime

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