2012
Poster
Title

Effect of HfO2 polycrystallinity on distribution of the CAFM-induced TDDB in high-k gate stacks

Title Supplement
Poster at 17th Workshop on Dielectrics in Microelectronics, June 25-27, 2012, Dresden
Author(s)
Iglesias, V.
Erlbacher, T.  
Rommel, Mathias  orcid-logo
Murakami, K.
Bauer, A.J.
Frey, L.
Porti, M.
Martin-Martinez, J.
Rodriguez, R.
Nafria, M.
Aymerich, X.
Bersuker, G.
Conference
DOI
File(s)
Rights
Under Copyright
Language
English
Keyword(s)