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  4. Plasma-assisted atomic layer deposition of alumina at room temperature
 
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2012
Poster
Title

Plasma-assisted atomic layer deposition of alumina at room temperature

Title Supplement
Poster at 17th Workshop on Dielectrics in Microelectronics (WoDiM 2012), June 25-27, 2012, Dresden
Author(s)
Lemberger, Martin
Fromm, Timo
Rommel, Mathias  orcid-logo
Bauer, A.J.
Frey, Lothar
Conference
Workshop on Dielectrics in Microelectronics (WoDiM) 2012  
DOI
10.24406/publica-fhg-376166
File(s)
001.pdf (4.41 MB)
Rights
Under Copyright
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • PEALD

  • ALD

  • Al2O3

  • current conduction mechanisms

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