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  4. Nanoscale characterization of TiO2 films grown by atomic layer deposition
 
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2012
Poster
Title

Nanoscale characterization of TiO2 films grown by atomic layer deposition

Title Supplement
Poster at 17th Workshop on Dielectrics in Microelectronics, June 25-27, 2012, Dresden
Author(s)
Murakami, Katsuhisa
Rommel, Mathias  orcid-logo
Bauer, A.J.
Frey, Lothar
Hudec, Boris
Rosova, A.
Hueková, K.
Fröhlich, Karol
Kasikov, A.
Ramula, R.
Aarik, J.
Han, J.H.
Han, S.
Lee, W.
Song, S.J.
Hwang, C.S.
Conference
Workshop on Dielectrics in Microelectronics (WoDiM) 2012  
File(s)
Download (1.4 MB)
Download (1.37 MB)
Rights
Use according to copyright law
DOI
10.24406/publica-fhg-376165
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • tunneling AFM

  • TUNA

  • conductive AFM

  • cAFM

  • high-k

  • grain and grain boundary

  • TiO2

  • leakage current

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