2011
Poster
Title

Rigorous EMF simulation of the impact of photomask line-edge and line-width roughness on lithographic processes

Title Supplement
Poster at SPIE Photomask Technology, September, Monterey, California
Author(s)
Rudolph, Oliver
Evanschitzky, Peter  
Erdmann, Andreas  
Bär, Eberhard  orcid-logo
Lorenz, Jürgen  
Conference
DOI
File(s)
Rights
Under Copyright
Language
English
Keyword(s)