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  4. Characterization of thickness variations of thin dielectric layers at a nanoscale using Scanning Capacitance Microscopy
 
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2010
Poster
Title

Characterization of thickness variations of thin dielectric layers at a nanoscale using Scanning Capacitance Microscopy

Title Supplement
Poster at WoDiM 2010, 16th Workshop on Dielectric Materials 2010, 28.06.-30.06.2010, Bratislava, Slovak Republic
Author(s)
Yanev, V.
Rommel, Mathias  orcid-logo
Bauer, A.J.
Frey, L.
Conference
Workshop on Dielectrics in Microelectronics (WoDiM) 2010  
DOI
10.24406/publica-fhg-370480
File(s)
001.pdf (974.19 KB)
Rights
Under Copyright
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • high-k dielectric thin films

  • scanning probe microscopy

  • silicon compounds

  • surface roughness

  • zirconium oxide

  • silicon oxide

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