• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Plasma etching of SnO2: F films at atmospheric pressure for silicon thin film solar cells
 
  • Details
  • Full
Options
2010
Conference Paper
Title

Plasma etching of SnO2: F films at atmospheric pressure for silicon thin film solar cells

Title Supplement
Abstract
Author(s)
Lopez, E.
Dresler, B.
Leupolt, B.
Dani, I.
Kaskel, S.
Beyer, E.
Mainwork
Nanofair 2010, 8th International Nanotechnology Symposium. Abstractband  
Conference
International Nanotechnology Symposium (Nanofair) 2010  
Language
English
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024