Honeycomb textured multicrystalline silicon via nanoimprint lithography

A new approach for realizing a defined texture on multicrystalline silicon for solar cells was investigated. The necessary etching mask is structured via UV-Nanoimprint Lithography as a potential substitute for photolithography. This emerging technology offers new possibilities in terms of resolution, shape of the structured patterns and requirements to the substrate´s surface quality. After the UV sensitive resist is structured and cross-linked, it serves as etching mask within a reactive ion etching process. To evaluate the quality of the textured surfaces, optical as well as electrical characterisation was conducted.