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  4. Chemical and gas-phase kinetics in a CHF3 + Ar discharge
 
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2009
Conference Paper
Title

Chemical and gas-phase kinetics in a CHF3 + Ar discharge

Abstract
The present work deals with experimental investigation as well as modeling of radical and metastable kinetics in a trifluoromethane/argon plasma. Therefore, space- and time-resolved laser-induced fluorescence measurements of the CF and CF2 densities were carried out. For the interpretation of the observed glow and afterglow density data, the discharge was modeled from both the plasma kinetical and chemical point of view.
Author(s)
Barz, Jakob Philipp  orcid-logo
Fraunhofer-Institut für Grenzflächen- und Bioverfahrenstechnik IGB  
Lunk, A.
Oehr, Christian  
Mainwork
19th International Symposium on Plasma Chemistry, ISPC 2009. Online Proceedings  
Conference
International Symposium on Plasma Chemistry (ISPC) 2009  
Link
Link
Language
English
Fraunhofer-Institut für Grenzflächen- und Bioverfahrenstechnik IGB  
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